- chemical deposition from the gas phase
- хімічне відкладення з газової фази
Англійсько-український словник авіаційних термінів / Уклад.: Р.О. Гільченко. - К.: НАУ. 2009.
Англійсько-український словник авіаційних термінів / Уклад.: Р.О. Гільченко. - К.: НАУ. 2009.
Chemical vapor deposition — DC plasma (violet) enhances the growth of carbon nanotubes in this laboratory scale PECVD apparatus. Chemical vapor deposition (CVD) is a chemical process used to produce high purity, high performance solid materials. The process is often used in … Wikipedia
chemical element — Introduction also called element, any substance that cannot be decomposed into simpler substances by ordinary chemical processes. Elements are the fundamental materials of which all matter is composed. This article considers the… … Universalium
Chemical beam epitaxy — (CBE) forms an important class of deposition techniques for semiconductor layer systems, especially III V semiconductor systems. This form of epitaxial growth is performed in an ultrahigh vacuum system. The reactants are in the form of molecular… … Wikipedia
Metalorganic vapour phase epitaxy — (MOVPE), also known as organometallic vapour phase epitaxy (OMVPE) or metalorganic chemical vapour deposition (MOCVD), is a chemical vapour deposition method of epitaxial growth of materials, especially compound semiconductors from the surface… … Wikipedia
Phase transition — This diagram shows the nomenclature for the different phase transitions. A phase transition is the transformation of a thermodynamic system from one phase or state of matter to another. A phase of a thermodynamic system and the states of matter… … Wikipedia
Gas — This article is about the physical properties of gas as a state of matter. For the uses of gases, and other meanings, see Gas (disambiguation). Ga … Wikipedia
Hybrid Physical-Chemical Vapor Deposition — (HPCVD) is a thin film deposition technique that combines physical vapor deposition (PVD) with chemical vapor deposition (CVD). For the instance of magnesium diboride (MgB2) thin film growth, HPCVD process uses diborane (B2H6) as the boron… … Wikipedia
Sublimation (phase transition) — Dark green crystals of nickelocene, freshly sublimed on a cold finger … Wikipedia
Flue gas desulfurization — (FGD) is the technology used for removing sulfur dioxide (SO2) from the exhaust flue gases in power plants that burn coal or oil to produce steam for the steam turbines that drive their electricity generators. Sulfur dioxide is responsible for… … Wikipedia
Chemical Vapour Deposition — Unter dem Begriff chemische Gasphasenabscheidung (englisch chemical vapor deposition, CVD) versteht man eine Gruppe von Beschichtungsverfahren, welche unter anderem bei der Herstellung von mikroelektronischen Bauelementen eingesetzt werden.… … Deutsch Wikipedia
Chemical vapor deposition — Unter dem Begriff chemische Gasphasenabscheidung (englisch chemical vapor deposition, CVD) versteht man eine Gruppe von Beschichtungsverfahren, welche unter anderem bei der Herstellung von mikroelektronischen Bauelementen eingesetzt werden.… … Deutsch Wikipedia